低损耗氮化硅晶圆

产品描述

尺寸	Si层规格	SiO₂规格	Si₃N₄规格	Si₃N₄ 沉积工艺
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	75nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	210nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	250nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	300nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	350nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	800nm±5%	LPCVD
4 inch	Diameter:4″-100mm Orientation:(100) Thickness: 525 +/- 25um Surface: SSP	3um	70nm±5%	LPCVD
4 inch	Diameter:4″-100mm Orientation:(100) Thickness: 525 +/- 25um Surface: DSP	3um	350nm±5%	LPCVD
4 inch	Diameter:4″-100mm Orientation:(100) Thickness: 525 +/- 25um Surface: SSP	3um	400nm±5%	LPCVD

地址：浙江省杭州市富阳区大源镇塘子畈街200号A座401