Low-loss Si₃N₄ Wafers

Product Description

Silicon nitride has a wide transparency window and plays an important role in the fields of thin film optics, integrated photonic devices, nonlinear optics, etc.
We provide low-loss SiN Wafers (dB/m level) with customized film thickness from 70 nm to 800 nm, and with 4/6 inch size.
Models & Specifications of SiN Wafer Stock:

Size	Si Layer Information	SiO₂ Thickness	Si₃N₄ Thickness	Si₃N₄ Deposition Process
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	75nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	210nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	250nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	300nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	350nm±5%	LPCVD
6 inch	Diameter:6″-150mm Orientation:(100) Thickness: 625 +/- 10um Surface: SSP	3um	800nm±5%	LPCVD
4 inch	Diameter:4″-100mm Orientation:(100) Thickness: 525 +/- 25um Surface: SSP	3um	70nm±5%	LPCVD
4 inch	Diameter:4″-100mm Orientation:(100) Thickness: 525 +/- 25um Surface: DSP	3um	350nm±5%	LPCVD
4 inch	Diameter:4″-100mm Orientation:(100) Thickness: 525 +/- 25um Surface: SSP	3um	400nm±5%	LPCVD

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